Invention Grant
- Patent Title: Additive processing apparatus and method
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Application No.: US14598322Application Date: 2015-01-16
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Publication No.: US10675854B2Publication Date: 2020-06-09
- Inventor: Bart A. Van Hassel
- Applicant: United Technologies Corporation
- Applicant Address: US CT Farmington
- Assignee: RAYTHEON TECHNOLOGIES CORPORATION
- Current Assignee: RAYTHEON TECHNOLOGIES CORPORATION
- Current Assignee Address: US CT Farmington
- Agency: Carlson, Gaskey & Olds, P.C.
- Main IPC: B23K26/34
- IPC: B23K26/34 ; B23K26/12 ; B23K26/14 ; B33Y30/00 ; B33Y10/00 ; B22F3/105 ; B29C64/364 ; B01D47/00 ; B29C64/35 ; B29C64/153

Abstract:
An additive processing apparatus includes a chamber and an irradiation device that together are operable to additively fabricate an article from a powder layer-by-layer in a work space in the chamber. A gas recirculation loop is connected at a first end thereof to an outlet of the chamber and at a second end thereof to an inlet of the chamber. The gas recirculation loop includes at least one purification device that is configured to remove impurities from a cover gas and generate a clean cover gas.
Public/Granted literature
- US20160207147A1 ADDITIVE PROCESSING APPARATUS AND METHOD Public/Granted day:2016-07-21
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