Disclosed is a composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH2═CHF), HCFO-1140 (CH2═CHCl), and HCFO-1131 (CH2═CFCl and/or trans/cis-CHF═CHCl) and combination thereof, said halogenated impurity being present in said composition in an amount of 50 ppm or less.