- Patent Title: Methods and systems for generating patterns on flexible substrates
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Application No.: US16013622Application Date: 2018-06-20
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Publication No.: US10676809B2Publication Date: 2020-06-09
- Inventor: Kevie Overton Dowhower
- Applicant: Lockheed Martin Corporation
- Applicant Address: US MD Bethesda
- Assignee: Lockheed Martin Corporation
- Current Assignee: Lockheed Martin Corporation
- Current Assignee Address: US MD Bethesda
- Agency: Baker Botts L.L.P.
- Main IPC: C23C14/04
- IPC: C23C14/04 ; B41M5/00

Abstract:
According to certain embodiments, a method of producing a pattern on a substrate comprises securing a flexible polymeric substrate, printing a layer of ink as a negative pattern on the substrate, and placing the flexible polymeric substrate in a vacuum chamber. The method further includes uniformly applying, while the flexible polymeric is under a vacuum in the vacuum chamber, a layer of material over both the layer of ink and the substrate via physical vapor deposition and then removing the flexible polymeric substrate from the vacuum chamber. The method further includes removing the ink and material applied over the ink by immersing the flexible polymeric substrate in a solvent such that it results in a desired pattern of the material on the flexible polymeric substrate.
Public/Granted literature
- US20190390317A1 PATTERN GENERATION SYSTEM AND METHOD Public/Granted day:2019-12-26
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