Invention Grant
- Patent Title: Photomask blank and method for preparing photomask
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Application No.: US15436128Application Date: 2017-02-17
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Publication No.: US10678125B2Publication Date: 2020-06-09
- Inventor: Takuro Kosaka , Yukio Inazuki , Hideo Kaneko
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2eee3df4 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@83e9424
- Main IPC: G03F1/22
- IPC: G03F1/22 ; G03F1/58 ; G03F1/54 ; G03F1/26 ; G03F1/80 ; H01L21/027
Abstract:
A photomask blank comprising a transparent substrate and a light-shielding film disposed thereon is provided. The light-shielding film is constructed by a single layer or multiple layers including a light-shielding layer containing Si and N, having a N content of 3-50 at % based on the sum of Si and N, being free of a transition metal.
Public/Granted literature
- US20170255095A1 PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK Public/Granted day:2017-09-07
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