Invention Grant
- Patent Title: Extreme ultraviolet (EUV) radiation source and a method for generating extreme ultraviolet radiation
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Application No.: US16245774Application Date: 2019-01-11
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Publication No.: US10678138B2Publication Date: 2020-06-09
- Inventor: Wei-Chun Yen , Chi Yang , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, P.C., Intellectual Property Attorneys
- Agent Anthony King
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20

Abstract:
The EUV radiation source includes a rotatable EUV source vessel configured to collect fuel debris generated from the collision of fuel droplets and a laser beam. The source vessel includes an inner surface for receiving the fuel debris, an first aperture at one end of the inner surface, and a heater adjacent to the inner surface and configured to generate a heating area on the inner surface in coordination with a rotation speed of the source vessel. The fuel debris is reflowed to the heating area. A method for generating EUV radiation includes collecting fuel debris on an inner surface of a source vessel, rotating the source vessel at a rotation speed, and heating a portion of the source vessel to an elevated temperature to generate a heating area on the inner surface in coordination with the rotation speed. The fuel debris is reflowed to the heating area.
Public/Granted literature
- US20200041908A1 EXTREME ULTRAVIOLET (EUV) RADIATION SOURCE AND A METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION Public/Granted day:2020-02-06
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