- Patent Title: Suppression filter, radiation collector and radiation source for a lithographic apparatus; method of determining a separation distance between at least two reflective surface levels of a suppression filter
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Application No.: US15753811Application Date: 2016-08-02
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Publication No.: US10678140B2Publication Date: 2020-06-09
- Inventor: Vadim Yevgenyevich Banine , Han-Kwang Nienhuys , Luigi Scaccabarozzi
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@f0d1e8a
- International Application: PCT/EP2016/068445 WO 20160802
- International Announcement: WO2017/032569 WO 20170302
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00 ; G02B5/18 ; G02B27/42 ; G02B5/20 ; G02B5/28

Abstract:
Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.
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