• Patent Title: Layout method, mark detection method, exposure method, measurement device, exposure apparatus, and device manufacturing method
  • Application No.: US15714703
    Application Date: 2017-09-25
  • Publication No.: US10678152B2
    Publication Date: 2020-06-09
  • Inventor: Yuichi Shibazaki
  • Applicant: NIKON CORPORATION
  • Applicant Address: JP Tokyo
  • Assignee: NIKON CORPORATION
  • Current Assignee: NIKON CORPORATION
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff PLC
  • Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@52cfb060
  • Main IPC: G03F9/00
  • IPC: G03F9/00 G03F7/20 H01L21/68
Layout method, mark detection method, exposure method, measurement device, exposure apparatus, and device manufacturing method
Abstract:
On a substrate conforming to a layout method for a plurality of marks for detection using a plurality of mark detection systems of which the detection centers are arranged at a predetermined spacing along an X-axis direction, a plurality of shot areas are formed in both an X-axis direction and a Y-axis direction orthogonal thereto in an XY plane, and sets including at least two marks separated in the X-axis direction are repeatedly arranged along the X-axis direction at spacing of a length in the X-axis-direction of each shot area, and the marks belonging to each set are separated from each other in the X-axis direction by a spacing determined based arrangement in the X-axis direction of the plurality of mark detection systems and the length. It is thereby possible to reliably detect a plurality of marks on a substrate using a plurality of mark detection systems.
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