Invention Grant
- Patent Title: Aligning method for use in semiconductor inspection apparatus
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Application No.: US16104309Application Date: 2018-08-17
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Publication No.: US10678370B2Publication Date: 2020-06-09
- Inventor: Lin-Lin Chih , Guan-Jhih Liou , Chien-Hung Chen , Yung-Chin Liu
- Applicant: MPI Corporation
- Applicant Address: TW Hsinchu County
- Assignee: MPI CORPORATION
- Current Assignee: MPI CORPORATION
- Current Assignee Address: TW Hsinchu County
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@135f9e09
- Main IPC: G06F3/041
- IPC: G06F3/041 ; G06T7/00 ; G06T7/73

Abstract:
An aligning method for use in semiconductor inspection apparatus is provided. The semiconductor inspection apparatus includes a stage and a touch-control screen. The aligning method includes defining a reference direction; displaying an image of a device under test supported by the stage on the touch-control screen; detecting a first touch point and a second touch point occurred on the touch-control screen; defining a straight line according to the first touch point and the second touch point; calculating an included angle defined by the straight and the reference direction; and rotating the stage according to the included angle.
Public/Granted literature
- US20190171328A1 ALIGNING METHOD FOR USE IN SEMICONDUCTOR INSPECTION APPARATUS Public/Granted day:2019-06-06
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