Invention Grant
- Patent Title: Adjusting the projection system of a distance sensor to optimize a beam layout
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Application No.: US16164113Application Date: 2018-10-18
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Publication No.: US10679076B2Publication Date: 2020-06-09
- Inventor: Akiteru Kimura
- Applicant: Magik Eye Inc.
- Applicant Address: US NY New York
- Assignee: Magik Eye Inc.
- Current Assignee: Magik Eye Inc.
- Current Assignee Address: US NY New York
- Agency: Tong, Rea, Bentley & Kim LLC
- Main IPC: G01B11/26
- IPC: G01B11/26 ; G06K9/00 ; H04N9/31 ; H04N5/235 ; G01B11/02 ; G01B11/25

Abstract:
A projection pattern is projected onto an object from a projection point of a distance sensor. The projection pattern is created by a plurality of beams of light projected from the projection point. The plurality of beams creates a plurality of projection artifacts that is arranged on the surface of the object. A layout of the plurality of projection artifacts depends on a positional relationship between the projection point and an image capturing device of the distance sensor. At least one parameter that defines the positional relationship between the projection point and an image capturing device of the distance sensor is optimized, prior to projecting the pattern, to minimize overlap of trajectories associated with the projection artifacts. An image of the object, including at least a portion of the adjusted projection pattern, is captured. A distance from the distance sensor to the object is calculated using information from the image.
Public/Granted literature
- US20190122057A1 ADJUSTING THE PROJECTION SYSTEM OF A DISTANCE SENSOR TO OPTIMIZE A BEAM LAYOUT Public/Granted day:2019-04-25
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