Quantum device comprising FET transistors and qubits co-integrated on the same substrate
Abstract:
Quantum device comprising: a quantum component forming a qubit, formed in an active layer of a substrate and comprising: a confinement region; charge carrier reservoirs; a first front gate covering the confinement region; first lateral spacers arranged around the first gate and covering access regions; an FET transistor formed in the active layer, comprising channel, source and drain regions formed in the active layer, a second front gate covering the channel region, and second lateral spacers arranged around the second front gate and covering source and drain extension regions; and wherein a width of the first lateral spacers is greater than that of the second lateral spacers.
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