Invention Grant
- Patent Title: Metal nanowire electrode and manufacturing method of the same
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Application No.: US15863165Application Date: 2018-01-05
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Publication No.: US10679764B2Publication Date: 2020-06-09
- Inventor: Jae Ho Ahn , Sang Youn Han , Jung Yong Lee
- Applicant: Samsung Display Co., Ltd. , KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Gyeonggi-Do KR Daejeon
- Assignee: SAMSUNG DISPLAY CO., LTD.,KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: SAMSUNG DISPLAY CO., LTD.,KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Gyeonggi-Do KR Daejeon
- Agency: Cantor Colburn LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@b26393c
- Main IPC: H01B1/02
- IPC: H01B1/02 ; B32B43/00 ; B32B38/10 ; B32B37/00 ; H01L51/00 ; H01L31/0224 ; H01L51/52 ; H01B3/44 ; H01B3/42 ; G02F1/1343 ; G06F3/041 ; H01B3/30

Abstract:
A method of manufacturing a metal nanowire electrode, the method including: forming a plurality of metal nanowires on a preliminary substrate; forming a metal nanowire layer by chemically reducing the plurality of metal nanowires; separating the metal nanowire layer from the preliminary substrate; transferring the separated metal nanowire layer to a surface of a carrier substrate, wherein the surface of the carrier substrate comprises a hydrophobic treatment; forming an adhesive pattern on a target substrate; and forming the metal nanowire electrode by transferring the separated metal nanowire layer to the target substrate.
Public/Granted literature
- US20180358144A1 METAL NANOWIRE ELECTRODE AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2018-12-13
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