Invention Grant
- Patent Title: Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate
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Application No.: US15814325Application Date: 2017-11-15
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Publication No.: US10679825B2Publication Date: 2020-06-09
- Inventor: Ying Wu , Alex Paterson , John Drewery , Arthur Sato
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H03H11/28 ; H01L21/67 ; H01L21/687

Abstract:
Systems and methods for applying frequency and match tuning in a non-overlapping manner are described. For example, a radio frequency (RF) generator is tuned for a time interval and an impedance match is not tuned for the time interval. The impedance match is tuned before or after the RF generator is tuned. Such a non-overlap in the tuning of the RF generator and the impedance match facilitates a reduction in reflected power during a pulse without the tuning of the RF generator interfering with the tuning of the impedance match.
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