A cylindrical sputtering target includes a cylindrical substrate and a cylindrical sputtering target member joined together with a joining material. Where the joining material has a thickness of d (μm), the joining material has a coefficient of thermal expansion of α1 (μm/μmK), and a melting point of the joining material and room temperature have a difference of ΔT (K), a surface of the cylindrical sputtering target member on the side of the joining material has a value of ten-point average roughness (Rz) fulfilling: d (μm)×α1 (μm/μmK)×ΔT (K)≤Rz (μm).