Invention Grant
- Patent Title: Substrate liquid processing apparatus, substrate liquid processing method and storage medium
-
Application No.: US16120884Application Date: 2018-09-04
-
Publication No.: US10679872B2Publication Date: 2020-06-09
- Inventor: Hideaki Sato
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@46dee9e2
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/66 ; B05C11/10 ; H01L21/306
Abstract:
A substrate liquid processing apparatus includes a liquid processing unit configured to store a processing liquid and a substrate and process the substrate using the processing liquid, the processing liquid including a phosphoric acid aqueous solution; a phosphoric acid aqueous solution supply unit configured to supply the phosphoric acid aqueous solution to the liquid processing unit; a discharge line connected to the liquid processing unit, and configured to discharge the processing liquid; a return line switchably connected to the discharge line, and configured to return the processing liquid to the liquid processing unit; a recycling line switchably connected to the discharge line, and including a recycling unit configured to recycle the processing liquid; and a waste line switchably connected to the discharge line, and configured to discard the processing liquid to the outside.
Public/Granted literature
- US20190006201A1 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD AND STORAGE MEDIUM Public/Granted day:2019-01-03
Information query
IPC分类:
