Structures and methods for making nanosheet structures with an electrically isolating feature associated therewith. The structure includes: a substrate, an epitaxial oxide layer over the substrate, a plurality of stacked nanosheets of semiconductor channel material over the epitaxial layer, and a source/drain semiconductor material located laterally adjacent and on each side of the plurality of stacked nanosheets of semiconductor channel material, where the plurality of nanosheets are decoupled from the source/drain semiconductor material by the epitaxial oxide layer.