Invention Grant
- Patent Title: Vertical field effect transistor including integrated antifuse
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Application No.: US15486599Application Date: 2017-04-13
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Publication No.: US10679998B2Publication Date: 2020-06-09
- Inventor: Kangguo Cheng , Juntao Li , Geng Wang , Qintao Zhang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L27/112
- IPC: H01L27/112 ; H01L23/525 ; H01L29/51 ; H01L29/423 ; H01L27/12 ; H01L29/66 ; H01L29/08 ; H01L29/786 ; H01L29/78 ; G11C17/16 ; G11C17/18

Abstract:
A vertical field effect transistor (FET) includes a vertical semiconductor channel having a first end that contacts an upper surface of a substrate and an opposing second end that contacts a source/drain region. An electrically conductive gate encapsulates the vertical semiconductor channel. The vertical FET further includes a split-channel antifuse device between the source/drain region and the electrically conductive gate. The split-channel antifuse device includes a gate dielectric having a thickness that varies between the source/drain region and the electrically conductive gate.
Public/Granted literature
- US20180061845A1 VERTICAL FIELD EFFECT TRANSISTOR INCLUDING INTEGRATED ANTIFUSE Public/Granted day:2018-03-01
Information query
IPC分类: