Invention Grant
- Patent Title: Non-volatile semiconductor memory device
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Application No.: US15319875Application Date: 2015-06-17
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Publication No.: US10680001B2Publication Date: 2020-06-09
- Inventor: Yasuhiro Taniguchi , Yasuhiko Kawashima , Hideo Kasai , Yutaka Shinagawa , Ryotaro Sakurai , Kosuke Okuyama
- Applicant: Floadia Corporation
- Applicant Address: JP Tokyo
- Assignee: FLOADIA CORPORATION
- Current Assignee: FLOADIA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3b22e0e5
- International Application: PCT/JP2015/067412 WO 20150617
- International Announcement: WO2015/194582 WO 20151223
- Main IPC: H01L27/148
- IPC: H01L27/148 ; H01L27/11521 ; H01L27/11565 ; H01L27/1157 ; H01L23/522 ; H01L23/528 ; H01L27/11519 ; H01L29/06 ; H01L29/10

Abstract:
In the non-volatile semiconductor memory device, a mobile charge collector layer, a mobile charge collecting contact, a mobile charge collecting first wiring layer, an in-between contact between the mobile charge collector layers, and a mobile charge collecting second wiring layer are disposed adjacent to a floating gate. Thereby, without increasing areas of active regions in the non-volatile semiconductor memory device, the number of mobile charges collected near the floating gate is reduced. The non-volatile semiconductor memory device allows high-speed operation of a memory cell while reducing fluctuations in a threshold voltage of the memory cell caused by collection of the mobile charges, which are attracted from an insulation layer, near the floating gate.
Public/Granted literature
- US20170133391A1 Non-Volatile Semiconductor Memory Device Public/Granted day:2017-05-11
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