Invention Grant
- Patent Title: Power gate switching system
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Application No.: US16191674Application Date: 2018-11-15
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Publication No.: US10680015B2Publication Date: 2020-06-09
- Inventor: Hoijin Lee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@f1f85ee com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@2742185b com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7e8de563 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1733bddb
- Main IPC: H01L27/118
- IPC: H01L27/118 ; H01L27/02 ; H01L23/528

Abstract:
A semiconductor device includes: a virtual power line extended in a first direction; an n-well extended in the first direction, wherein the virtual power line and the n-well are disposed in a row; a first power gate switch cell disposed in the n-well; a second power gate switch cell disposed in the n-well, wherein the first and second power gate switch cells are first type cells; and a third power gate switch cell disposed in the n-well between the first and second power gate switch cells, wherein the third power gate switch cell is a second type cell different from the first type cells.
Public/Granted literature
- US20190088679A1 POWER GATE SWITCHING SYSTEM Public/Granted day:2019-03-21
Information query
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