Invention Grant
- Patent Title: Concave reflector for complementary metal oxide semiconductor image sensor (CIS)
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Application No.: US15935341Application Date: 2018-03-26
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Publication No.: US10680024B2Publication Date: 2020-06-09
- Inventor: Po-Han Huang , Jiech-Fun Lu , Yu-Chun Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L27/146

Abstract:
In some embodiments, the present disclosure relates to an integrated chip having an inter-layer dielectric (ILD) structure along a first surface of a substrate having a photodetector. An etch stop layer is over the ILD structure, and a reflector is surrounded by the etch stop layer and the ILD structure. The reflector has a curved surface facing the substrate at a location directly over the photodetector. The curved surface is coupled between a first sidewall and a second sidewall of the reflector. The reflector has larger thicknesses along the first sidewall and the second sidewall than at a center of the reflector between the first sidewall and the second sidewall.
Public/Granted literature
- US20190057994A1 CONCAVE REFLECTOR FOR COMPLEMENTARY METAL OXIDE SEMICONDUCTOR IMAGE SENSOR (CIS) Public/Granted day:2019-02-21
Information query
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