Invention Grant
- Patent Title: Gated diode having fingers with elevated gates
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Application No.: US16122841Application Date: 2018-09-05
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Publication No.: US10680087B2Publication Date: 2020-06-09
- Inventor: Cheong Min Hong , Chunshan Yin , Yu Chen
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L29/66 ; H01L27/02

Abstract:
An integrated circuit has a first gated diode with one or more diode fingers. Each diode finger has an elevated gate, an underlying p-type diffusion, and an underlying n-type diffusion. Each diffusion has a base region and an annular side region located between the base region and the elevated gate such that the diffusions have increased lateral surface areas that support greater current levels for the diode finger, which enables gated diodes to be implemented with fewer fingers and therefore less layout area than equivalent conventional gated diodes that do not have elevated gates. The first gated diode can be implemented with an analogous second gated diode to form ESD-protection circuitry for the integrated circuit.
Public/Granted literature
- US20200075751A1 GATED DIODE HAVING FINGERS WITH ELEVATED GATES Public/Granted day:2020-03-05
Information query
IPC分类: