Invention Grant
- Patent Title: High voltage tolerant LDMOS
-
Application No.: US15389217Application Date: 2016-12-22
-
Publication No.: US10680098B2Publication Date: 2020-06-09
- Inventor: Shih-Hung Chen , Dimitri Linten , Geert Hellings
- Applicant: IMEC VZW
- Applicant Address: BE Leuven
- Assignee: IMEC vzw
- Current Assignee: IMEC vzw
- Current Assignee Address: BE Leuven
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4cdb31f7
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/417 ; H01L29/10 ; H01L29/06 ; H01L29/08

Abstract:
An LDMOS device in FinFET technology is disclosed. In one aspect, the device includes a first region substantially surrounded by a second region of different polarity. The device further includes a first fin in the first region, extending into the second region, the first fin including a doped source region connected with a first local interconnect. The device further includes a second fin in the second region, including a doped drain region connected with a second local interconnect. The device further includes a third fin parallel with the first and second fins including a doped drain region connected with the second local interconnect. The device further includes a gate over the first fin at the border between the first and second regions. A first current path runs over the first and second fins. A second current path runs over and perpendicular to the first fin towards the third fin.
Public/Granted literature
- US20170194487A1 HIGH VOLTAGE TOLERANT LDMOS Public/Granted day:2017-07-06
Information query
IPC分类: