- Patent Title: Gas-diffusion electrode substrate and method of manufacturing same
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Application No.: US15567111Application Date: 2016-04-15
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Publication No.: US10680250B2Publication Date: 2020-06-09
- Inventor: Masaru Hashimoto , Michio Wakatabe , Sho Kato
- Applicant: Toray Industries, Inc.
- Applicant Address: JP Tokyo
- Assignee: Toray Industries, Inc.
- Current Assignee: Toray Industries, Inc.
- Current Assignee Address: JP Tokyo
- Agency: DLA Piper LLP (US)
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@42b4416e
- International Application: PCT/JP2016/062149 WO 20160415
- International Announcement: WO2016/171082 WO 20161027
- Main IPC: H01M4/88
- IPC: H01M4/88 ; H01M4/86 ; H01M4/96 ; H01M8/0245 ; H01M8/10 ; H01M8/1004

Abstract:
A gas-diffusion electrode substrate includes an electrode substrate and a microporous layer (MPL) disposed on one surface of the electrode substrate, wherein the gas-diffusion electrode substrate has a thickness of 110 μm or more and 240 μm or less, and where a cross section of the gas-diffusion electrode substrate is divided into a part having the MPL and a part having no MPL, and the part having no MPL is further equally divided into a part (CP1 cross section) in contact with the MPL and a part (CP2 cross section) not in contact with the MPL, the CP1 cross section has an F/C ratio of 0.03 or more and 0.10 or less and the CP2 cross section has an F/C ratio less than 0.03, wherein F is a mass of a fluorine atom, and C is a mass of a carbon atom.
Public/Granted literature
- US20180102552A1 GAS-DIFFUSION ELECTRODE SUBSTRATE AND METHOD OF MANUFACTURING SAME Public/Granted day:2018-04-12
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