Invention Grant
- Patent Title: Workpiece processing chamber having a rotary microwave plasma antenna with slotted spiral waveguide
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Application No.: US15907102Application Date: 2018-02-27
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Publication No.: US10685812B2Publication Date: 2020-06-16
- Inventor: Michael W. Stowell
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01Q13/22
Abstract:
A microwave antenna includes a first spiral conduit having a first conduit end, first plural ports in a floor of the first spiral conduit spaced apart along the length of the first spiral conduit; an axial conduit coupled to a rotatable stage; and a distributor waveguide comprising an input coupled to the axial conduit and a first output coupled to the first conduit end.
Public/Granted literature
- US20180190472A1 WORKPIECE PROCESSING CHAMBER HAVING A ROTARY MICROWAVE PLASMA ANTENNA WITH SLOTTED SPIRAL WAVEGUIDE Public/Granted day:2018-07-05
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