Invention Grant
- Patent Title: Semiconductor device
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Application No.: US16082244Application Date: 2016-06-08
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Publication No.: US10685932B2Publication Date: 2020-06-16
- Inventor: Sho Suzuki , Tsuyoshi Osaga
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Studebaker & Brackett PC
- International Application: PCT/JP2016/067080 WO 20160608
- International Announcement: WO2017/212578 WO 20171214
- Main IPC: H01L31/0312
- IPC: H01L31/0312 ; H01L23/00 ; H01L29/45

Abstract:
A semiconductor substrate (1) has a front surface and a back surface that are opposite each other. A first metal layer (2) is formed on the front surface of the semiconductor substrate (1). A second metal layer (3) for soldering is formed on the first metal layer (2). A third metal layer (5) is formed on the back surface of the semiconductor substrate (1). A fourth metal layer (6) for soldering is formed on the third metal layer (5). The second metal layer (3) has a larger thickness than that of the fourth metal layer (6). The first, third, and fourth metal layers (2,5,6) are not divided in a pattern. The second metal layer (3) is divided in a pattern and has a plurality of metal layers electrically connected to each other via the first metal layer (2).
Public/Granted literature
- US20200144215A1 SEMICONDUCTOR DEVICE Public/Granted day:2020-05-07
Information query
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