- Patent Title: Filter structure for chemical solution used in manufacturing integrated circuit and apparatus for supplying chemical solution including filter structure for chemical solution
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Application No.: US16122454Application Date: 2018-09-05
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Publication No.: US10688437B2Publication Date: 2020-06-23
- Inventor: Cha-won Koh , Oleg Feygenson , Jung-hyeon Kim , Hyun-woo Kim , Eun-sung Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@44dd7184
- Main IPC: B01D61/42
- IPC: B01D61/42 ; G03F7/26 ; B01D63/06 ; B01D61/46 ; G03F7/16 ; H01L21/027 ; B01D29/58 ; B01D29/15

Abstract:
A filter structure for chemical solution used in manufacturing an integrated circuit includes: a first membrane structure comprising a plurality of membrane units, each comprising a cathode comprising a plurality of first openings, an anode comprising a plurality of second openings, and an insulating layer between the cathode and the anode; and a filter housing configured to receive the first membrane structure therein, the filter housing comprising an inlet through which the chemical solution is introduced and an outlet through which the chemical solution is discharged. The first membrane structure is configured such that when an electric field is applied between the cathode and the anode while the chemical solution introduced through the inlet passes through the first membrane structure, impurities having both positively charged particles and negatively charged particles in the chemical solution are trapped in the first membrane structure.
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