Invention Grant
- Patent Title: Heat treatment device
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Application No.: US15677100Application Date: 2017-08-15
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Publication No.: US10690416B2Publication Date: 2020-06-23
- Inventor: Kazuhiko Katsumata
- Applicant: IHI Corporation , IHI Machinery and Furnace Co., Ltd.
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: IHI CORPORATION,IHI MACHINERY AND FURNACE CO., LTD.
- Current Assignee: IHI CORPORATION,IHI MACHINERY AND FURNACE CO., LTD.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@35b13449
- Main IPC: F27D9/00
- IPC: F27D9/00 ; C21D1/773 ; C21D1/767 ; F27D7/04 ; F27B5/04 ; F27B19/02 ; F27B5/02 ; C21D9/00

Abstract:
A heat treatment device includes: a heat treatment chamber which accommodates an object to be treated; a cooling gas supply unit which supplies a cooling gas into the heat treatment chamber; a cooling gas circulation unit which circulates the cooling gas in the heat treatment chamber; and a gas purge unit which gas-purges, with an inert gas, a portion in which there is a possibility of mixing of the cooling gas supplied into the heat treatment chamber and an oxygen gas, in which the cooling gas supply unit supplies a hydrogen gas into the heat treatment chamber as the cooling gas.
Public/Granted literature
- US20180010854A1 HEAT TREATMENT DEVICE Public/Granted day:2018-01-11
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