Conflict mask generation
Abstract:
Single Instruction, Multiple Data (SIMD) technologies are described. A processor can store a first bitmap and generate a second bitmap with each cell identifying a mask bit. The mask bit is set when 1) a corresponding cell in a first bitmap is not in conflict with other elements in the first bitmap or 2) a corresponding cell is in conflict with one or more other cells in the first bitmap and is a last cell in a sequential order of the first bitmap that conflicts with the one or more other cells, wherein a position of each cell in the second bitmap maps to a same position of the corresponding cell in the first bitmap. The processor can store the second bitmap as a mask for a scatter operation to avoid lane conflicts.
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