Invention Grant
- Patent Title: Conflict mask generation
-
Application No.: US16249134Application Date: 2019-01-16
-
Publication No.: US10691454B2Publication Date: 2020-06-23
- Inventor: Jun Jin , Elmoustapha Ould-Ahmed-Vall
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Lowenstein Sandler LLP
- Main IPC: G06F9/312
- IPC: G06F9/312 ; G06F9/305 ; G06F9/30 ; G06F9/38

Abstract:
Single Instruction, Multiple Data (SIMD) technologies are described. A processor can store a first bitmap and generate a second bitmap with each cell identifying a mask bit. The mask bit is set when 1) a corresponding cell in a first bitmap is not in conflict with other elements in the first bitmap or 2) a corresponding cell is in conflict with one or more other cells in the first bitmap and is a last cell in a sequential order of the first bitmap that conflicts with the one or more other cells, wherein a position of each cell in the second bitmap maps to a same position of the corresponding cell in the first bitmap. The processor can store the second bitmap as a mask for a scatter operation to avoid lane conflicts.
Public/Granted literature
- US20190146794A1 CONFLICT MASK GENERATION Public/Granted day:2019-05-16
Information query