Aspects of the disclosed technology relate to techniques of pattern-based resolution enhancement. Surrounding areas for a plurality of geometric layout elements in a layout design are partitioned into geometric space elements. The plurality of geometric layout elements and the geometric space elements are grouped, through pattern classification, into geometric layout element groups and geometric space element groups, respectively. Optical proximity correction is performed for each of the geometric layout element groups and sub-resolution assist feature insertion is performed for each of the geometric space element groups. The results are applied to the plurality of geometric layout elements and the geometric space elements in the layout design.