Invention Grant
- Patent Title: Electron emission device and method for manufacturing the same
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Application No.: US16369004Application Date: 2019-03-29
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Publication No.: US10692680B2Publication Date: 2020-06-23
- Inventor: Kenichiro Nakamatsu , Tokio Taguchi , Kohji Shinkawa , Mai Takasaki , Tadashi Iwamatsu
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Sakai
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Sakai
- Agency: Keating & Bennett, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@28228344
- Main IPC: H01J3/02
- IPC: H01J3/02 ; H01L21/02 ; H01L21/768 ; H01J9/02

Abstract:
A method of producing an electron emitting device includes: step A of providing an aluminum substrate or providing an aluminum layer supported by a substrate; step B of anodizing a surface of the aluminum substrate or a surface of the aluminum layer to form a porous alumina layer having a plurality of pores; step C of applying Ag nanoparticles in the plurality of pores to allow the Ag nanoparticles to be supported in the plurality of pores; step D of, after step C, applying a dielectric layer-forming solution onto substantially the entire surface of the aluminum substrate or the aluminum layer, the dielectric layer-forming solution containing, in an amount of not less than 7 mass % but less than 20 mass %, a polymerization product having siloxane bonds; step E of, after step D, at least reducing a solvent contained in the dielectric layer-forming solution to form the dielectric layer; and step F of forming an electrode on the dielectric layer.
Public/Granted literature
- US20190304732A1 ELECTRON EMISSION DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2019-10-03
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