Invention Grant
- Patent Title: Silicon-containing compound, urethane resin, stretchable film, and method for forming the same
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Application No.: US16156293Application Date: 2018-10-10
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Publication No.: US10696779B2Publication Date: 2020-06-30
- Inventor: Jun Hatakeyama , Yuji Harada , Shiori Nonaka , Ryo Mitsui , Osamu Watanabe
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@5212efa
- Main IPC: C08G18/00
- IPC: C08G18/00 ; C08G18/38 ; C07F7/08 ; C08G18/75 ; C08G77/458 ; C08G18/61 ; C09D175/16 ; C08J5/18

Abstract:
The present invention provides a silicon-containing compound shown by the following formula (1): wherein R1, R2, R3, R4, R5, and R6 each independently represent a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, a phenyl group, a 3,3,3-trifluoropropyl group, or a group shown by —(OSiR7R8)n—OSiR9R10R11; R7, R8, R9, R10, and R11 have the same meanings as R1 to R6; “n” is an integer in the range of 0 to 100; and “A” represents a linear or branched alkylene group having 1 to 6 carbon atoms. This provides a stretchable film that has excellent stretchability and strength, with the film surface having excellent repellency, and a method for forming the same; as well as a urethane resin used for the stretchable film; and a silicon-containing compound to be a material of the urethane resin.
Public/Granted literature
- US20190112413A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND METHOD FOR FORMING THE SAME Public/Granted day:2019-04-18
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