Invention Grant
- Patent Title: Metal oxide/silicon dioxide-coated quantum dot and method for preparing same
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Application No.: US15996510Application Date: 2018-06-03
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Publication No.: US10696900B2Publication Date: 2020-06-30
- Inventor: Liang Li , Zhichun Li
- Applicant: Liang Li
- Applicant Address: CN Shanghai
- Assignee: Liang Li
- Current Assignee: Liang Li
- Current Assignee Address: CN Shanghai
- Agency: Wayne & Ken, LLC
- Agent Tony Hom
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4db80415
- Main IPC: C09K11/02
- IPC: C09K11/02 ; C09K11/66 ; C09K11/70 ; C09K11/88 ; B82Y30/00 ; B82Y20/00 ; B82Y40/00

Abstract:
A metal oxide/silicon dioxide-coated quantum dot and a preparation method thereof are provided. The metal oxide/silicon dioxide is selected from aluminum oxide/silicon dioxide, zirconium dioxide/silicon dioxide, titanium dioxide/silicon dioxide or zinc oxide/silicon dioxide, and the content of the metal oxide/silicon dioxide in the metal oxide/silicon dioxide-coated quantum dot is 1 wt % to 98 wt %. The metal oxide/silicon dioxide-coated quantum dot is prepared by one of a sol-gel method and a pyrolysis method.
Public/Granted literature
- US20180273839A1 METAL OXIDE/SILICON DIOXIDE-COATED QUANTUM DOT AND METHOD FOR PREPARING SAME Public/Granted day:2018-09-27
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