Invention Grant
- Patent Title: Membranes for use within a lithographic apparatus and a lithographic apparatus comprising such a membrane
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Application No.: US16247179Application Date: 2019-01-14
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Publication No.: US10698312B2Publication Date: 2020-06-30
- Inventor: Pieter-Jan Van Zwol , Vadim Yevgenyevich Banine , Jozef Petrus Henricus Benschop , Florian Didier Albin Dhalluin , Mária Péter , Luigi Scaccabarozzi , Willem Joan Van Der Zande
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7f22a5f4 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3a4fad55
- Main IPC: G03F1/62
- IPC: G03F1/62 ; G03F1/24 ; G02B5/20 ; G03F7/20 ; G02B5/18 ; G03F1/38
Abstract:
A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane has one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are within some or all of the additional layers.
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