Invention Grant
- Patent Title: Chemically amplified resist composition and patterning process
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Application No.: US15814659Application Date: 2017-11-16
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Publication No.: US10698314B2Publication Date: 2020-06-30
- Inventor: Jun Hatakeyama
- Applicant: SHIN-ETSU CHEMICAL CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@45fbae13
- Main IPC: G03F7/028
- IPC: G03F7/028 ; G03F7/004 ; G03F7/039 ; G03F7/20 ; G03F7/42 ; C08F12/24 ; C09D125/18 ; C08F212/14 ; C08F220/38 ; C08K5/19 ; C08F220/28 ; C08F220/30 ; C08L25/04 ; C08L33/08 ; C08L33/10 ; C08L41/00
Abstract:
A chemically amplified resist composition comprising a quencher containing a quaternary ammonium iodide, dibromoiodide, bromodiiodide or triiodide, and an acid generator exhibits a sensitizing effect and an acid diffusion suppressing effect and forms a pattern having improved resolution, LWR and CDU.
Public/Granted literature
- US20180143532A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS Public/Granted day:2018-05-24
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