Invention Grant
- Patent Title: Metrology method, computer product and system
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Application No.: US16700381Application Date: 2019-12-02
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Publication No.: US10698322B2Publication Date: 2020-06-30
- Inventor: Arie Jeffrey Den Boef , Kaustuve Bhattacharyya
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7a818e2f
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B11/27 ; G01B11/24

Abstract:
A method including determining a type of structural asymmetry of the target from measured values of the target, and performing a simulation of optical measurement of the target to determine a value of an asymmetry parameter associated with the asymmetry type. A method including performing a simulation of optical measurement of a target to determine a value of an asymmetry parameter associated with a type of structural asymmetry of the target determined from measured values of the target, and analyzing a sensitivity of the asymmetry parameter to change in a target formation parameter associated with the target. A method including determining a structural asymmetry parameter of a target using a measured parameter of radiation diffracted by the target, and determining a property of a measurement beam of the target based on the structural asymmetry parameter that is least sensitive to change in a target formation parameter associated with the target.
Public/Granted literature
- US20200103762A1 METROLOGY METHOD, COMPUTER PRODUCT AND SYSTEM Public/Granted day:2020-04-02
Information query
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