Invention Grant
- Patent Title: Acetylide-based silicon precursors and their use as ALD/CVD precursors
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Application No.: US15413956Application Date: 2017-01-24
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Publication No.: US10699897B2Publication Date: 2020-06-30
- Inventor: Mark Saly , Bhaskar Jyoti Bhuyan , Jeffrey W. Anthis , Feng Q. Liu , David Thompson
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/30 ; C23C16/455 ; C23C16/40 ; C23C16/32 ; C23C16/34 ; C23C16/36
Abstract:
Provided are acetylide-based compounds and methods of making the same. Also provided are methods of using said compounds in film deposition processes to deposit films comprising silicon. Certain methods comprise exposing a substrate surface to a acetylide-based precursor and a reactant in various combinations.
Public/Granted literature
- US20170213726A1 Acetylide-Based Silicon Precursors And Their Use As ALD/CVD Precursors Public/Granted day:2017-07-27
Information query
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