Invention Grant
- Patent Title: Semiconductor device
-
Application No.: US15998606Application Date: 2018-08-21
-
Publication No.: US10700059B2Publication Date: 2020-06-30
- Inventor: Tatsuya Naito
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@494430d7 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7c37512a
- Main IPC: H01L29/739
- IPC: H01L29/739 ; H01L27/06 ; H01L29/861 ; H01L29/06 ; H01L27/07 ; H01L29/40 ; H01L29/08 ; H01L29/423 ; H01L27/082 ; H01L29/10

Abstract:
In order to reduce electric field concentration in a semiconductor device including a main transistor section and a sense transistor section, the semiconductor device is provided, the semiconductor device including a semiconductor substrate of a first conductivity type, a main transistor section in an active region on the semiconductor substrate, and a sense transistor section outside the active region on the semiconductor substrate, wherein the active region is provided with a main well region of a second conductivity type, and wherein the sense transistor section has a sense gate trench section formed extending from the outside of the active region to the main well region on the front surface of the semiconductor substrate.
Public/Granted literature
- US20190013313A1 SEMICONDUCTOR DEVICE Public/Granted day:2019-01-10
Information query
IPC分类: