Invention Grant
- Patent Title: Array substrate and manufacturing method thereof, and display device
-
Application No.: US15740008Application Date: 2017-11-23
-
Publication No.: US10700102B2Publication Date: 2020-06-30
- Inventor: Longqiang Shi
- Applicant: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@4473d0f4
- International Application: PCT/CN2017/112628 WO 20171123
- International Announcement: WO2019/052008 WO 20190321
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/02 ; H01L29/66 ; H01L29/786

Abstract:
The present invention provides an array substrate and a manufacturing method thereof, and a display device. The array substrate comprises a base substrate, a metal pattern layer, a data line pattern layer, and a scan line pattern layer. Wherein, the data line pattern layer or the scan line pattern layer and the metal pattern layer are arranged in different layers and are directly connected to the metal pattern layer. So that the data line pattern layer or the scan line pattern layer and the metal pattern layer are formed a parallel structure. Because the resistance of the parallel structure is smaller than the resistance of the data line pattern layer or the scan line pattern layer, the resistance of the parallel structure when is used as a data line or a scan line, is reduced, thereby the display effect is improved.
Public/Granted literature
- US20200043947A1 Array Substrate And Manufacturing Method Thereof, And Display Device Public/Granted day:2020-02-06
Information query
IPC分类: