- Patent Title: Piezoelectric device and production method for piezoelectric device
-
Application No.: US15600828Application Date: 2017-05-22
-
Publication No.: US10700262B2Publication Date: 2020-06-30
- Inventor: Yutaka Kishimoto
- Applicant: Murata Manufacturing Co., Ltd.
- Applicant Address: JP Kyoto
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7053708a
- Main IPC: H01L41/053
- IPC: H01L41/053 ; H01L41/332 ; H01L41/337 ; H03H3/08 ; H03H9/25 ; H01L41/04 ; H01L41/08 ; H01L41/09 ; H01L41/18 ; H01L41/27 ; H03H3/02 ; H03H9/02

Abstract:
A piezoelectric resonator includes a piezoelectric thin film including a functional conductor, a fixing layer provided on a principal surface of the piezoelectric thin film to define a void that overlaps a functional portion region, and a support substrate on a principal surface of the fixing layer. A sacrificial layer is provided on a principal surface of a piezoelectric substrate and the fixing layer is provided on the principal surface of the piezoelectric substrate to cover the sacrificial layer. The support substrate is attached to a surface of the fixing layer and the piezoelectric thin film is peeled from the piezoelectric substrate. The functional conductor is provided on the piezoelectric thin film, a through hole is provided in the piezoelectric thin film to straddle a boundary between the fixing layer and the sacrificial layer, and the sacrificial layer is removed by wet etching using the through hole to form the void.
Public/Granted literature
- US20170256701A1 PIEZOELECTRIC DEVICE AND PRODUCTION METHOD FOR PIEZOELECTRIC DEVICE Public/Granted day:2017-09-07
Information query
IPC分类: