Invention Grant
- Patent Title: Magnetoresistive element, manufacturing method thereof and magnetic sensor
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Application No.: US16163703Application Date: 2018-10-18
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Publication No.: US10700267B2Publication Date: 2020-06-30
- Inventor: Kohei Honma , Satoshi Miura
- Applicant: TDK Corporation
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6287185d com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@1bab75ea
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L43/10 ; G01R33/09 ; H01L27/22 ; H01L43/12

Abstract:
A magnetoresistive element has a magnetization free layer whose magnetization direction changes in an external magnetic field; a magnetization pinned layer whose magnetization direction is pinned in the external magnetic field; and a barrier layer that is positioned between the magnetization free layer and the magnetization pinned layer and that exhibits a magnetoresistive effect. The barrier layer is an oxide of an alloy that includes Mg and Al, and the barrier layer includes a crystalline region and a non-crystalline region.
Public/Granted literature
- US20190148626A1 MAGNETORESISTIVE ELEMENT, MANUFACTURING METHOD THEREOF AND MAGNETIC SENSOR Public/Granted day:2019-05-16
Information query
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