Invention Grant
- Patent Title: RRAM cell structure with laterally offset BEVA/TEVA
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Application No.: US16227096Application Date: 2018-12-20
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Publication No.: US10700275B2Publication Date: 2020-06-30
- Inventor: Chih-Yang Chang , Wen-Ting Chu , Kuo-Chi Tu , Yu-Wen Liao , Hsia-Wei Chen , Chin-Chieh Yang , Sheng-Hung Shih , Wen-Chun You
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
The present disclosure, in some embodiments, relates to a memory device. The memory device includes a bottom electrode via and a bottom electrode over a top of the bottom electrode via. A data storage layer is over the bottom electrode and a top electrode is over the data storage layer. A top electrode via is on an upper surface of the top electrode and is centered along a first line that is laterally offset from a second line centered upon a bottommost surface of the bottom electrode via. The first line is perpendicular to the upper surface of the top electrode and parallel to the second line.
Public/Granted literature
- US20190123271A1 RRAM CELL STRUCTURE WITH LATERALLY OFFSET BEVA/TEVA Public/Granted day:2019-04-25
Information query
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