Invention Grant
- Patent Title: Metal-semiconductor-metal two-dimensional electron gas varactor and method of manufacturing the same
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Application No.: US15827290Application Date: 2017-11-30
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Publication No.: US10700667B2Publication Date: 2020-06-30
- Inventor: Jae Hyung Jang , Ji Hyun Hwang
- Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Gwangju
- Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Gwangju
- Agency: Hauptman Ham, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3a8cd316
- Main IPC: H03J3/18
- IPC: H03J3/18 ; H03B5/12 ; H01L29/66 ; H01L29/93 ; H01L29/20 ; H01L29/205

Abstract:
Disclosed are a metal-semiconductor-metal two-dimensional electron gas varactor (MSM-2DEG) and a method of manufacturing the same. There is provided an MSM-2DEG varactor having an asymmetric structure, which includes a first gate formed on a semiconductor layer, and a second gate spaced apart at a predetermined distance from the first gate and formed on the semiconductor layer, wherein the first gate and the second gate are different in shape and gate length.
Public/Granted literature
- US20180241377A1 METAL-SEMICONDUCTOR-METAL TWO-DIMENSIONAL ELECTRON GAS VARACTOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-08-23
Information query
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