Invention Grant
- Patent Title: Method and device for enabling a pattern to be marked on a substrate
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Application No.: US16220282Application Date: 2018-12-14
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Publication No.: US10703099B1Publication Date: 2020-07-07
- Inventor: Andrew Yohn , Mikael Palmén
- Applicant: Markem-Imaje Corporation
- Applicant Address: US NH Keene
- Assignee: Markem-Imaje Corporation
- Current Assignee: Markem-Imaje Corporation
- Current Assignee Address: US NH Keene
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Main IPC: B41J2/04
- IPC: B41J2/04 ; B41J2/075 ; B41J3/407

Abstract:
A method for enabling marking of a pattern on a substrate with an industrial printer includes executing a genetic algorithm based on the pattern to be marked on the substrate. A result of the genetic algorithm indicates a resulting path which the industrial printer should follow when marking the pattern on the substrate. It is determined if the resulting path fulfills at least one criterion of: the resulting path matches an optimal path for marking the pattern, the resulting path substantially matches the optimal path, or a time spent for executing the genetic algorithm has reached or exceeded a threshold.
Information query
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