Invention Grant
- Patent Title: Block copolymer materials containing polyhedral oligomeric silsesquioxane(POSS)
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Application No.: US16133280Application Date: 2018-09-17
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Publication No.: US10703858B2Publication Date: 2020-07-07
- Inventor: Jae Suk Lee , Chang Geun Chae , Mallela Yadagiri Lakshmi Narasimha Kishore , Myung Jin Kim , In Gyu Bak , Ho Bin Seo , Yong Guen Yu
- Applicant: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Applicant Address: KR Gwangju
- Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee: GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: KR Gwangju
- Agency: Hauptman Ham, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@24f7798e
- Main IPC: C08G61/08
- IPC: C08G61/08 ; C08G81/00 ; C08L87/00
Abstract:
A macromolecular photonic crystal material including an A block and a B block is disclosed.the A block comprises a crystalline polyhedral oligomeric POSS, the macromolecular photonic crystal material represented by the structural formula 1.
Public/Granted literature
- US20190085118A1 POLYMERIC POLYMERIC MATERIALS CONTAINING POLYHEDRAL OLIGOMERIC SILSESQUIOXANE(POSS) Public/Granted day:2019-03-21
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