Invention Grant
- Patent Title: Water-soluble film and method for manufacturing same
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Application No.: US16065602Application Date: 2016-12-19
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Publication No.: US10703895B2Publication Date: 2020-07-07
- Inventor: Daisuke Michitaka , Masami Hattori , Hirotaka Mizoguchi
- Applicant: NIPPON SHOKUBAI CO., LTD.
- Applicant Address: JP Osaka
- Assignee: Nippon Shokubai Co., Ltd.
- Current Assignee: Nippon Shokubai Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@3aae5dc0
- International Application: PCT/JP2016/087814 WO 20161219
- International Announcement: WO2017/110749 WO 20170629
- Main IPC: C08L33/02
- IPC: C08L33/02 ; C08J5/18 ; C08L29/10 ; C08L101/02 ; C11D3/37 ; C08L101/14 ; C08F220/06 ; B65D65/46 ; C08L29/04 ; C08L29/06 ; C11D17/04

Abstract:
The present invention provides a water-soluble film having excellent solubility in cold water, high strength, and excellent hard-water resistance. The present invention also provides a method for simply producing such a water-soluble film. One aspect of the present invention relates to a water-soluble film including a polymer containing an anionic group other than a sulfonic acid (salt) group, and a water-soluble resin. The anionic group-containing polymer excludes an acrylic acid homopolymer. Another aspect of the present invention relates to a method for producing a water-soluble film that includes a polymer containing an anionic group other than a sulfonic acid (salt) group, and a water-soluble resin. The method includes mixing a polymer containing an anionic group other than a sulfonic acid (salt) group and a water-soluble resin.
Public/Granted literature
- US20190002683A1 WATER-SOLUBLE FILM AND METHOD FOR MANUFACTURING SAME Public/Granted day:2019-01-03
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