- Patent Title: Compositions and methods for the deposition of silicon oxide films
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Application No.: US15698794Application Date: 2017-09-08
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Publication No.: US10703915B2Publication Date: 2020-07-07
- Inventor: Xinjian Lei , Meiliang Wang , Matthew R. MacDonald , Richard Ho , Manchao Xiao , Suresh Kalpatu Rajaraman
- Applicant: Versum Materials US, LLC
- Applicant Address: US AZ Tempe
- Assignee: VERSUM MATERIALS US, LLC
- Current Assignee: VERSUM MATERIALS US, LLC
- Current Assignee Address: US AZ Tempe
- Agent David K. Benson
- Main IPC: C23C16/40
- IPC: C23C16/40 ; C23C16/455 ; C09D1/00 ; C01B33/12 ; C07F7/02 ; C07F7/10
Abstract:
Described herein are compositions and methods for forming silicon oxide films. In one aspect, the film is deposited from at least one silicon precursor compound, wherein the at least one silicon precursor compound is selected from the following Formulae A and B: as defined herein.
Public/Granted literature
- US20200040192A9 Compositions and Methods for the Deposition of Silicon Oxide Films Public/Granted day:2020-02-06
Information query
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