Invention Grant
- Patent Title: Coating compositions suitable for use with an overcoated photoresist
-
Application No.: US15652192Application Date: 2017-07-17
-
Publication No.: US10703917B2Publication Date: 2020-07-07
- Inventor: John P. Amara , James F. Cameron , Jin Wuk Sung , Gregory P. Prokopowicz
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: C09D5/00
- IPC: C09D5/00 ; H01L21/027 ; G03F7/16 ; G03F7/20 ; C08F220/36 ; G03F7/09 ; C07C69/76 ; C07C69/94 ; C09D133/14 ; G03F7/32

Abstract:
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Public/Granted literature
- US20170313889A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST Public/Granted day:2017-11-02
Information query
IPC分类: