- Patent Title: Soundproof structure and soundproof structure manufacturing method
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Application No.: US15802784Application Date: 2017-11-03
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Publication No.: US10704255B2Publication Date: 2020-07-07
- Inventor: Shinya Hakuta , Shogo Yamazoe , Tadashi Kasamatsu , Masayuki Naya
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@211fad13 com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@139ea0f1
- Main IPC: E04B1/84
- IPC: E04B1/84 ; E04B1/86 ; G10K11/172

Abstract:
A soundproof structure has a plurality of soundproof cells arranged in a two-dimensional manner. Each of the plurality of soundproof cells includes a frame formed of a frame member forming an opening and a film fixed to the frame. Two or more types of soundproof cells having different first resonance frequencies are present in the plurality of soundproof cells. A shielding peak frequency at which transmission loss is maximized is present within a range equal to or higher than a lowest frequency among first resonance frequencies of the soundproof cells and equal to or lower than a highest frequency among the first resonance frequencies of the soundproof cells.
Public/Granted literature
- US20180051462A1 SOUNDPROOF STRUCTURE AND SOUNDPROOF STRUCTURE MANUFACTURING METHOD Public/Granted day:2018-02-22
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