Invention Grant
- Patent Title: Using modeling to determine ion energy associated with a plasma system
-
Application No.: US15808017Application Date: 2017-11-09
-
Publication No.: US10707056B2Publication Date: 2020-07-07
- Inventor: John C. Valcore, Jr. , Bradford J. Lyndaker
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: H03H7/38
- IPC: H03H7/38 ; H01J37/32

Abstract:
Systems and methods for determining ion energy are described. One of the methods includes detecting output of a generator to identify a generator output complex voltage and current (V&I). The generator is coupled to an impedance matching circuit and the impedance matching circuit is coupled to an electrostatic chuck (ESC). The method further includes determining from the generator output complex V&I a projected complex V&I at a point along a path between an output of a model of the impedance matching circuit and a model of the ESC. The operation of determining of the projected complex V&I is performed using a model for at least part of the path. The method includes applying the projected complex V&I as an input to a function to map the projected complex V&I to a wafer bias value at the ESC model and determining an ion energy from the wafer bias value.
Public/Granted literature
- US20180068834A1 Using Modeling To Determine Ion Energy Associated With A Plasma System Public/Granted day:2018-03-08
Information query