Invention Grant
- Patent Title: End effector assembly for clean/dirty substrate handling
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Application No.: US15689330Application Date: 2017-08-29
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Publication No.: US10707113B2Publication Date: 2020-07-07
- Inventor: Ross Embertson , Brandon Senn , Austin Ngo , Matthew J. Rodnick
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Main IPC: H01L21/687
- IPC: H01L21/687 ; H01L21/677

Abstract:
An end effector includes a body, a first tine, and a second tine. The body includes first, second, and third substrate support pads, the first substrate support pad defines a first height, the second substrate support pad defines a second height less than the first height, and the third substrate support pad defines a third height equal to the first height. The first tine includes fourth and fifth substrate support pads, the fourth substrate support pad defines a fourth height equal to the second height, and the fifth substrate support pad defines a fifth height equal to the first and third heights. The second tine includes sixth and seventh substrate support pads, the sixth substrate support pad defines a sixth height equal to the first, third, and fifth heights, the seventh substrate support pad defines a seventh height equal to the second and fourth heights.
Public/Granted literature
- US20180005865A1 END EFFECTOR ASSEMBLY FOR CLEAN/DIRTY SUBSTRATE HANDLING Public/Granted day:2018-01-04
Information query
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