Invention Grant
- Patent Title: Processing method of wafer
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Application No.: US15887560Application Date: 2018-02-02
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Publication No.: US10707129B2Publication Date: 2020-07-07
- Inventor: Tetsukazu Sugiya , Heidi Lan
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain, Ltd.
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@7c714d01
- Main IPC: H01L21/268
- IPC: H01L21/268 ; H01L21/301 ; H01L21/304 ; H01L21/78 ; H01L21/67 ; H01L21/683

Abstract:
A processing method of a wafer includes a cut groove forming step of carrying out cutting with a cutting blade along streets from the back surface of the wafer to form cut grooves, a wafer dividing step of irradiating the wafer with a laser beam along the cut grooves and dividing the wafer into individual chips after the cut groove forming step is carried out, and a die bonding layer disposing step of applying a liquid die bonding agent on the back surface of the wafer and curing it to form the chips on which die bonding layers are formed on the back surface. According to the processing method of the present invention, the occurrence of clogging in the cutting blade and generation of a burr or the like in the die bonding layers can be prevented.
Public/Granted literature
- US20180226295A1 PROCESSING METHOD OF WAFER Public/Granted day:2018-08-09
Information query
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